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Title: Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing

Conformal coating of metal layers on three-dimensional structures is essential for advanced electronic devices such as storage elements, transistors, and sensors. The quality of atomic layer deposited platinum on oxide surfaces was enhanced by adding pre-deposition pulses of trimethylaluminum (TMA) for improved wetting. With an optimal number of TMA pre-pulses, a 6 nm thick Pt film was perfectly coalesced in contrast to only Pt island formation without TMA pre-pulses. A Pt gate all around Ge/Si nanowire field effect transistor was realized highlighting the potential of this approach for efficient deposition of Pt on 3D nanoelectronic devices.
Authors:
;  [1] ;  [1] ;  [2]
  1. Department of Electrical and Computer Engineering, University of California, San Diego, California 92093 (United States)
  2. (United States)
Publication Date:
OSTI Identifier:
22253153
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 103; Journal Issue: 26; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; COALESCENCE; DEPOSITION; ELECTRONIC EQUIPMENT; FIELD EFFECT TRANSISTORS; FILMS; LAYERS; NUCLEATION; OXIDES; PLATINUM; PULSES; SENSORS; SURFACES