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Title: Controlling the anisotropy and domain structure with oblique deposition and substrate rotation

Effect of substrate rotation on anisotropy and domain structure for a thin ferromagnetic film has been investigated in this work. For this purpose Co films with 10 nm thickness have been prepared by sputtering with oblique angle of incidence for various substrate rotations. This method of preparation induces a uniaxial anisotropy due to shadow deposition effect. The magnetization reversal is studied by magneto-optic Kerr effect (MOKE) based microscope in the longitudinal geometry. The Co films prepared by rotating the substrate with 10 and 20 rpm weakens the anisotropy but does not completely give isotropic films. But this leads to high dispersion in local grain anisotropy resulting in ripple and labyrinth domains. It is observed that the substrate rotation has moderate effect on uniaxial anisotropy but has significant effect on the magnetization reversal process and the domain structure.
Authors:
;  [1]
  1. School of Physical Sciences, National Institute of Science Education and Research (NISER), IOP Campus, Bhubaneswar-751005 (India)
Publication Date:
OSTI Identifier:
22251562
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Advances; Journal Volume: 4; Journal Issue: 2; Other Information: (c) 2014 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ANISOTROPY; DEPOSITION; DOMAIN STRUCTURE; FILMS; KERR EFFECT; MAGNETIZATION; ROTATION; SPUTTERING; SUBSTRATES