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Title: Fast and gentle side approach for atomic force microscopy

Atomic force microscopy is one of the most popular imaging tools with atomic resolution in different research fields. Here, a fast and gentle side approach for atomic force microscopy is proposed to image the same surface location and to reduce the time delay between modification and imaging without significant tip degradation. This reproducible approach to image the same surface location using atomic force microscopy shortly after, for example, any biological, chemical, or physical modification on a geometrically separated position has the potential to become widely used.
Authors:
; ; ;  [1] ;  [2]
  1. Faculty of Science and Technology and MESA Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede (Netherlands)
  2. Philips Innovation Services, High Tech Campus 7, 5656 AE Eindhoven (Netherlands)
Publication Date:
OSTI Identifier:
22251249
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 84; Journal Issue: 12; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; ATOMIC FORCE MICROSCOPY; IMAGE PROCESSING; IMAGES; SPATIAL RESOLUTION; TIME DELAY