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Title: Surface smoothing effect of an amorphous thin film deposited by atomic layer deposition on a surface with nano-sized roughness

Previously, Lau (one of the authors) pointed out that the deposition of an amorphous thin film by atomic layer deposition (ALD) on a substrate with nano-sized roughness probably has a surface smoothing effect. In this letter, polycrystalline zinc oxide deposited by ALD onto a smooth substrate was used as a substrate with nano-sized roughness. Atomic force microscopy (AFM) and cross-sectional transmission electron microscopy (XTEM) were used to demonstrate that an amorphous aluminum oxide thin film deposited by ALD can reduce the surface roughness of a polycrystalline zinc oxide coated substrate.
Authors:
; ; ;  [1] ;  [2] ;  [1] ;  [3]
  1. Zhejiang University, Department of Information Science and Electronic Engineering, No. 38 Zheda Road, Hangzhou 310027 (China)
  2. Zhejiang University, Department of Materials Science and Engineering, No. 38 Zheda Road, Hangzhou 310027 (China)
  3. (United Kingdom)
Publication Date:
OSTI Identifier:
22251226
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Advances; Journal Volume: 4; Journal Issue: 2; Other Information: (c) 2014 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ALUMINIUM OXIDES; ATOMIC FORCE MICROSCOPY; DEPOSITION; DEPOSITS; NANOSTRUCTURES; POLYCRYSTALS; ROUGHNESS; SUBSTRATES; SURFACES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; ZINC OXIDES