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Title: Note: Mechanical etching of atomic force microscope tip and microsphere attachment for thermal radiation scattering enhancement

This Note describes a mechanical etching technique which can be used to prepare silicon tips used in atomic force microscopy apparatus. For such devices, dedicated tips with specific shapes are now commonly used to probe surfaces. Yet, the control of the tip morphology where characteristic scales are lower than 1 μm remains a real challenge. Here, we detail a controlled etching process of AFM probes apex allowing micrometer-sized sphere attachment. The technique used and influent parameters are discussed and SEM images of the achieved tips are given. Deceptive problems and drawbacks that might occur during the process are also covered.
Authors:
; ;  [1]
  1. Université de Lorraine, LEMTA, UMR 7563, BP70239, 54500 Vandoeuvre-lés-Nancy (France)
Publication Date:
OSTI Identifier:
22251221
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 84; Journal Issue: 12; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; ATOMIC FORCE MICROSCOPY; ETCHING; IMAGES; MORPHOLOGY; PROBES; SCANNING ELECTRON MICROSCOPY; SCATTERING; SILICON; THERMAL RADIATION