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Title: Effect of magnetic field profile on the uniformity of a distributed electron cyclotron resonance plasma

This study extensively measured the uniformity of an electron cyclotron resonance (ECR) plasma versus the magnetic field distribution. The influence of magnetic field distribution on the generation of uniform ECR plasma was examined. It is suggested that in addition to the uniformity of the magnetic field distribution at ECR zone and at the downstream zone near the substrate, the transition of the magnetic field between these two zones is also crucial. A uniform ECR plasma with the electron density uniformity of ±7.7% over 500 × 500 mm{sup 2} was measured at the downstream. The idea of generating uniform ECR plasma can be scaled up to a much larger area by using an n × n microwave input array and a well-designed magnetic system.
Authors:
;  [1] ; ;  [2] ;  [3]
  1. Department of Mechanical Engineering, National Taiwan University, Taipei, Taiwan (China)
  2. Department of Physics, National Tsing Hua University, Hsinchu, Taiwan (China)
  3. Chung-Shan Institute of Science and Technology, Lung-Tan, Taoyuan, Taiwan (China)
Publication Date:
OSTI Identifier:
22227985
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 20; Journal Issue: 7; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ECR HEATING; ELECTRON CYCLOTRON-RESONANCE; ELECTRON DENSITY; MAGNETIC FIELD CONFIGURATIONS; MAGNETIC FIELDS; MICROWAVE RADIATION; PLASMA DENSITY; RF SYSTEMS; SUBSTRATES