skip to main content

Title: Spectroscopy diagnostic of dual-frequency capacitively coupled CHF{sub 3}/Ar plasma

A combined spectroscopic method of absorption, actinometry, and relative optical emission intensity is employed to determine the absolute CF{sub 2} density, the relative F and H densities, H atom excitation temperature and the electron density in dual-frequency (60/2 MHz) capacitively coupled CHF{sub 3}/Ar plasmas. The effects of different control parameters, such as high-frequency (HF) power, low-frequency (LF) power, gas pressure, gap length and content of CHF{sub 3}, on the concentration of radical CF{sub 2}, F, and H and excitation temperature are discussed, respectively. It is found that the concentration of CF{sub 2} is strongly dependent on the HF power, operating pressure and the proportion of CHF{sub 3} in feed gas, while it is almost independent of the LF power and the gap length. A higher concentration ratio of F to CF{sub 2} could be obtained in dual-frequency discharge case. Finally, the generation and decay mechanisms of CF{sub 2} and F were also discussed.
Authors:
;  [1] ; ; ; ;  [2] ; ; ;  [1] ;  [3]
  1. Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024 (China)
  2. School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China)
  3. (China)
Publication Date:
OSTI Identifier:
22218454
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 20; Journal Issue: 11; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; 74 ATOMIC AND MOLECULAR PHYSICS; ARGON; ATOMS; CARBON COMPOUNDS; CONCENTRATION RATIO; ELECTRON DENSITY; ELECTRON TEMPERATURE; EMISSION SPECTROSCOPY; EXCITATION; EXCITED STATES; FLUORINE; FLUOROFORM; HYDROGEN; ION TEMPERATURE; MHZ RANGE; PHOTON-ATOM COLLISIONS; PHOTON-MOLECULE COLLISIONS; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA PRESSURE