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Title: Mode transition in CF{sub 4} + Ar inductively coupled plasma

The E to H mode transitions are studied by a hairpin probe and optical emission spectroscopy in inductively coupled CF{sub 4} + Ar plasmas. Electron density, optical emission intensity of Ar, and the voltage and current are measured during the E to H mode transitions. It is found that the electron density and plasma emission intensity increase continuously at low pressure during the E to H mode transition, while they jump up discontinuously at high pressure. Meanwhile, the transition threshold power and △P (the power interval between E and H mode) increase by increasing the pressure. When the ratio of CF{sub 4} increases, the E to H mode transition happens at higher applied power, and meanwhile, the △P also significantly increases. Besides, the effects of CF{sub 4} gas ratio on the plasma properties and the circuit electrical properties in both pure E and H modes were also investigated. The electron density and plasma emission intensity both decrease upon increasing the ratio of CF{sub 4} at the two modes, due to the stronger electrons loss scheme. The applied voltages at E and H modes both increase as increasing the CF{sub 4} gas ratio, however the applied current at two modes behavemore » just oppositely with the gas ratio.« less
Authors:
; ; ; ;  [1]
  1. School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China)
Publication Date:
OSTI Identifier:
22218390
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 20; Journal Issue: 12; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ARGON; CARBON TETRAFLUORIDE; ELECTRIC POTENTIAL; ELECTRON DENSITY; ELECTRON LOSS; EMISSION SPECTROSCOPY; MODE CONVERSION; PLASMA; PLASMA DENSITY; PLASMA PRESSURE