In-situ energy dispersive x-ray diffraction study of the growth of CuO nanowires by annealing method

Journal Article · Mon Oct 14 00:00:00 EDT 2013 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4824177· OSTI ID:22217935

Srivastava, Himanshu; Ganguli, Tapas; Deb, S. K. ^[1]; Sant, Tushar; Poswal, H. K.; Sharma, Surinder M. ^[2]

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1. Indus Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced technology, Indore-452013 (India)
2. High Pressure and Synchrotron Radiation Physics Division, Bhabha Atomic Research Centre, Mumbai (India)

The in-situ growth of CuO nanowires was studied by Energy Dispersive X-ray Diffraction (EDXRD) to observe the mechanism of growth. The study was carried out for comparison at two temperatures—at 500 °C, the optimum temperature of the nanowires growth, and at 300 °C just below the temperature range of the growth. The in situ observation revealed the successive oxidation of Cu foil to Cu{sub 2}O layer and finally to CuO layer. Further analysis showed the presence of a compressive stress in CuO layer due to interface at CuO and Cu{sub 2}O layers. The compressive stress was found to increase with the growth of the nanowires at 500 °C while it relaxed with the growth of CuO layer at 300 °C. The present results do not support the existing model of stress relaxation induced growth of nanowires. Based on the detailed Transmission Electron Microscope, Scanning Electron Microscope, and EDXRD results, a microstructure based growth model has been suggested.

• OSTI ID: 22217935
• Journal Information: Journal of Applied Physics, Vol. 114, Issue 14; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
77 NANOSCIENCE AND NANOTECHNOLOGY
ANNEALING
COPPER OXIDES
CRYSTAL STRUCTURE
FOILS
INTERFACES
LAYERS
MICROSTRUCTURE
OXIDATION
QUANTUM WIRES
SCANNING ELECTRON MICROSCOPY
SEMICONDUCTOR MATERIALS
STRESS RELAXATION
STRESSES
TRANSMISSION ELECTRON MICROSCOPY
X RADIATION
X-RAY DIFFRACTION