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Title: Plasma reactivity in high-power impulse magnetron sputtering through oxygen kinetics

The atomic oxygen metastable dynamics in a Reactive High-Power Impulse Magnetron Sputtering (R-HiPIMS) discharge has been characterized using time-resolved diode laser absorption in an Ar/O{sub 2} gas mixture with a Ti target. Two plasma regions are identified: the ionization region (IR) close to the target and further out the diffusion region (DR), separated by a transition region. The μs temporal resolution allows identifying the main atomic oxygen production and destruction routes, which are found to be very different during the pulse as compared to the afterglow as deduced from their evolution in space and time.
Authors:
 [1] ;  [2] ;  [1] ;  [3] ;  [4] ;  [1]
  1. Laboratoire the Physique de Gaz et Plasmas, UMR 8578 CNRS, Université Paris-Sud, Orsay Cedex 91405 (France)
  2. (Romania)
  3. (Sweden)
  4. Division of Space and Plasma Physics, School of Electrical Engineering, Royal Institute of Technology, Stockholm, SE-100 44 (Sweden)
Publication Date:
OSTI Identifier:
22217927
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 103; Journal Issue: 10; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ABSORPTION; AFTERGLOW; ARGON; DEPOSITION; ELECTRIC DISCHARGES; EVOLUTION; MAGNETRONS; METASTABLE STATES; MIXTURES; OXYGEN; PLASMA DIAGNOSTICS; PULSES; REACTION KINETICS; SEMICONDUCTOR LASERS; SPUTTERING; TIME RESOLUTION; TITANIUM ALLOYS