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Title: The correlation between the radial distribution of high-energetic ions and the structural as well as electrical properties of magnetron sputtered ZnO:Al films

The origin of the pronounced radial distributions of structural and electrical properties of magnetron sputtered ZnO:Al films has been investigated. The film properties were correlated with the radially resolved ion-distribution functions. While the positive ions exhibit low energies and a radial distribution with a maximum intensity opposite the center of the target, the negative ions can have energies up to several hundred eV, depending on the target potential, with a radial distribution with two maxima opposite the erosion tracks. The most prominent positive ion is that of the working gas (Ar{sup +}), while the highest flux of the negative ions is measured for negative oxygen O{sup −}. The radial distribution of the flux of the high-energetic negative ions can clearly be related to the radial variations of the structural (c-axis lattice parameter, crystallite size) and electronic (resistivity) properties for sputtering from the planar target, which points to the decisive role of the high-energetic negative oxygen ions for the film quality. The relation between the negative ion bombardment and the structural as well as electronic properties can be explained by a qualitative model recently developed by us. The same target has also been investigated in the eroded state. In this case,more » the limited acceptance angle of the mass spectrometer leads to a misinterpretation of the radial distribution of the flux of the high-energetic negative ions. This effect can be explained by a simulation, based on the assumption that the high-energetic negative ions are mainly accelerated in the cathode (target) sheath perpendicular to the uneven substrate surface.« less
Authors:
; ;  [1]
  1. Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Institute for Solar Fuels, Hahn-Meitner-Platz 1, D-14109 Berlin (Germany)
Publication Date:
OSTI Identifier:
22217780
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 114; Journal Issue: 22; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ANIONS; ARGON IONS; CATHODES; CATIONS; DISTRIBUTION FUNCTIONS; ELECTRIC CONDUCTIVITY; EV RANGE; LATTICE PARAMETERS; MAGNETRONS; MASS SPECTROMETERS; OXYGEN; OXYGEN IONS; SEMICONDUCTOR MATERIALS; SPATIAL DISTRIBUTION; SPUTTERING; TAIL IONS; THIN FILMS; ZINC OXIDES