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Title: Formation of ultrasmooth thin silver films by pulsed laser deposition

Ultrasmooth thin silver films have been formed on a quartz substrate with a buffer yttrium oxide layer by pulsed laser deposition. The dependence of the surface morphology of the film on the gas (N{sub 2}) pressure in the working chamber and laser pulse energy is investigated. It is found that the conditions of film growth are optimal at a gas pressure of 10{sup -2} Torr and lowest pulse energy. The silver films formed under these conditions on a quartz substrate with an initial surface roughness of 0.3 nm had a surface roughness of 0.36 nm. These films can be used as a basis for various optoelectronics and nanoplasmonics elements.
Authors:
; ; ; ;  [1]
  1. NBIC Center, National Research Centre 'Kurchatov Institute' (Russian Federation)
Publication Date:
OSTI Identifier:
22210523
Resource Type:
Journal Article
Resource Relation:
Journal Name: Crystallography Reports; Journal Volume: 58; Journal Issue: 5; Other Information: Copyright (c) 2013 Pleiades Publishing, Ltd.; http://www.springer-ny.com; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ENERGY BEAM DEPOSITION; FILMS; LASER RADIATION; LASERS; LAYERS; MORPHOLOGY; PULSED IRRADIATION; PULSES; QUARTZ; ROUGHNESS; SILVER; SUBSTRATES; SURFACES; YTTRIUM OXIDES