skip to main content

Title: Towards an electro-magnetic field separation of deposited material implemented in an ion beam sputter process

Nowadays, Ion Beam Sputter (IBS) processes are very well optimized on an empirical basis. To achieve further progresses, a modification of the IBS process by guiding the coating material using an axial magnetic field and an additional electrical field has been studied. The electro-magnetic (EM) field leads to a significant change in plasma properties and deposition rate distributions, whereas an increase in deposition rate along the centerline of the axial EM field around 150% was observed. These fundamental studies on the prototype are the basis for the development of an applicable and workable design of a separation device.
Authors:
; ;  [1] ;  [2]
  1. Laser Component Department, Laser Zentrum Hannover e.V., Hollerithallee 8, 30149 Hannover (Germany)
  2. (Germany)
Publication Date:
OSTI Identifier:
22162963
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 102; Journal Issue: 22; Other Information: (c) 2013 Copyright-Sign 2013 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; BEAMS; DEPOSITION; DISTRIBUTION; ELECTRIC FIELDS; ELECTROMAGNETIC FIELDS; ION BEAMS; MAGNETIC FIELDS; MODIFICATIONS; PLASMA; SILICON; SOLENOIDS; SPUTTERING; TITANIUM