Laser-plasma source parameters for Kr, Gd, and Tb ions at 6.6 nm
- The Townes Laser Institute, College of Optics and Photonics, University of Central Florida, 4000 Central Florida Blvd., Orlando, Florida 32816 (United States)
There is increasing interest in extreme-ultraviolet (EUV) laser-based lamps for sub-10-nm lithography operating in the region of 6.6 nm. A collisional-radiative model is developed as a post-processor of a hydrodynamic code to investigate emission from resonance lines in Kr, Gd, and Tb ions under conditions typical for mass-limited EUV sources. The analysis reveals that maximum conversion efficiencies of Kr occur at 5 Multiplication-Sign 10{sup 10}W/cm{sup 2}, while for Gd and Tb it was Asymptotically-Equal-To 0.9%/2{pi}sr for laser intensities of (2-5) Multiplication-Sign 10{sup 12}W/cm{sup 2}.
- OSTI ID:
- 22162863
- Journal Information:
- Applied Physics Letters, Vol. 102, Issue 16; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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