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Title: Interfacial perpendicular magnetic anisotropy and damping parameter in ultra thin Co{sub 2}FeAl films

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4802952· OSTI ID:22162858
 [1]; ; ;  [2];  [3];  [1]
  1. Department of Physics, University of Virginia, Charlottesville, Virginia 22904 (United States)
  2. Department of Physics and Astronomy, MINT Center, University of Alabama, Tuscaloosa, Alabama 35487 (United States)
  3. Department of Materials Science and Engineering, University of Virginia, Charlottesville, Virginia 22904 (United States)

B2-ordered Co{sub 2}FeAl films were synthesized using an ion beam deposition tool. A high degree of chemical ordering {approx}81.2% with a low damping parameter ({alpha}) less than 0.004 was obtained in a 50 nm thick film via rapid thermal annealing at 600 Degree-Sign C. The perpendicular magnetic anisotropy (PMA) was optimized in ultra thin Co{sub 2}FeAl films annealed at 350 Degree-Sign C without an external magnetic field. The reduced thickness and annealing temperature to achieve PMA introduced extrinsic factors thus increasing {alpha} significantly. However, the observed damping of Co{sub 2}FeAl films was still lower than that of Co{sub 60}Fe{sub 20}B{sub 20} films prepared at the same thickness and annealing temperature.

OSTI ID:
22162858
Journal Information:
Applied Physics Letters, Vol. 102, Issue 16; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English