Three-dimensional extreme ultraviolet emission from a droplet-based laser-produced plasma
- Laboratory for Energy Conversion, ETH Zurich, 8092 Zurich (Switzerland)
The emission of extreme ultraviolet radiation in a 2% bandwidth centered at 13.5 nm (in-band) is measured in one hemisphere. The targets of the laser are tin droplets. In-band emission is measured at angles from the laser axis larger than 120 Degree-Sign . Analytical models representing the physical processes are developed and calibrated with the experimental data. In the models two assumptions are investigated, isentropic and isothermal 2D-axisymmetric expansion. The parameters of the models are the density distribution of the plasma and the location where the EUV emission is centered. The parameters are inferred by the calibration of the models with the experimental data. The predictions of the models are validated with experiments where slab targets were used.
- OSTI ID:
- 22122837
- Journal Information:
- Journal of Applied Physics, Vol. 114, Issue 3; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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