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Title: Electronic properties of the interface between hexadecafluoro copper phthalocyanine and unsubstituted copper phthalocyanine films

The formation of an interface during the deposition of unsubstituted copper phthalocyanine (CuPc) films on the surface of hexadecafluoro copper phthalocyanine (F{sub 16}-CuPc) films is studied. An incident low-energy electron beam with energies from 0 to 25 eV is used to test the surface under study according to the very-low-energy electron-diffraction technique (VLEED) in the mode of total current spectroscopy. For F{sub 16}-CuPc films, the structure of the maxima in the total current spectra and its main differences from the structure of the maxima for the CuPc film are determined in the energy range from 5 to 15 eV above the Fermi level. The differences in the structure of vacant electron orbitals for CuPc and F{sub 16}-CuPc are also revealed using density functional theory calculations. As a result of an analysis of variations in the intensities of the total current spectra of the CuPc and F{sub 16}-CuPc films, it is assumed that an intermediate layer up to 1 nm thick appears during the formation of an interface between these films, which is characterized by a spread of the features in the total current spectrum. The height, width, and change in the work function are determined for the studied F{sub 16}-CuPc/NuPcmore » interface barrier. A decrease in the level of vacuum by 0.7 eV occurs in the boundary region, which corresponds to electron density transfer from the CuPc film toward the F{sub 16}-CuPc substrate.« less
Authors:
;  [1] ;  [2] ; ; ; ; ; ;  [1]
  1. Saint Petersburg State University, Faculty of Physics (Russian Federation)
  2. Russian Academy of Sciences, Institute of Molecular and Crystal Physics, Ufa Research Center (Russian Federation)
Publication Date:
OSTI Identifier:
22121703
Resource Type:
Journal Article
Resource Relation:
Journal Name: Semiconductors; Journal Volume: 47; Journal Issue: 7; Other Information: Copyright (c) 2013 Pleiades Publishing, Ltd.; http://www.springer-ny.com; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; COPPER COMPLEXES; DENSITY FUNCTIONAL METHOD; ELECTRON BEAMS; ELECTRON DENSITY; ELECTRON DIFFRACTION; ELECTRONS; EV RANGE 01-10; EV RANGE 10-100; FERMI LEVEL; FILMS; INTERFACES; PHTHALOCYANINES; SPECTRA; SPECTROSCOPY; WORK FUNCTIONS