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Title: Effects of He and Ar ion kinetic energies in protection of organosilicate glass from O{sub 2} plasma damage

In-situ x-ray photoelectron spectroscopy (XPS) and ex-situ Fourier transform infrared studies of He plasma and Ar{sup +} ion bombardment pretreatments of organosilicate glass demonstrate that such pretreatments inhibit subsequent O{sub 2} plasma-induced carbon loss by forming a SiO{sub 2}-like damaged overlayer, and that the degree of protection correlates directly with increased ion kinetic energies, but not with the thickness of the SiO{sub 2} overlayer. This thickness is observed by XPS to be roughly constant and <1 nm regardless of ion energies involved. The data indicate that ion kinetic energies are an important parameter in protective noble gas plasma pretreatments to inhibit O{sub 2} plasma-induced carbon loss.
Authors:
;  [1] ; ; ;  [2]
  1. Department of Chemical Engineering, University of California-Berkeley, Berkeley, California 94720 (United States)
  2. Department of Chemistry and Center for Electronic Materials Processing and Integration, University of North Texas, Denton, Texas 76203 (United States)
Publication Date:
OSTI Identifier:
22121652
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 31; Journal Issue: 4; Other Information: (c) 2013 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; ARGON; ARGON IONS; CARBON; DAMAGE; FOURIER TRANSFORMATION; GLASS; HELIUM; INFRARED SPECTRA; ION BEAMS; KINETIC ENERGY; LAYERS; OXIDATION; PLASMA; SILICATES; SILICON OXIDES; SURFACE TREATMENTS; THICKNESS; X-RAY PHOTOELECTRON SPECTROSCOPY