Effects of He and Ar ion kinetic energies in protection of organosilicate glass from O{sub 2} plasma damage
- Department of Chemical Engineering, University of California-Berkeley, Berkeley, California 94720 (United States)
- Department of Chemistry and Center for Electronic Materials Processing and Integration, University of North Texas, Denton, Texas 76203 (United States)
In-situ x-ray photoelectron spectroscopy (XPS) and ex-situ Fourier transform infrared studies of He plasma and Ar{sup +} ion bombardment pretreatments of organosilicate glass demonstrate that such pretreatments inhibit subsequent O{sub 2} plasma-induced carbon loss by forming a SiO{sub 2}-like damaged overlayer, and that the degree of protection correlates directly with increased ion kinetic energies, but not with the thickness of the SiO{sub 2} overlayer. This thickness is observed by XPS to be roughly constant and <1 nm regardless of ion energies involved. The data indicate that ion kinetic energies are an important parameter in protective noble gas plasma pretreatments to inhibit O{sub 2} plasma-induced carbon loss.
- OSTI ID:
- 22121652
- Journal Information:
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 31, Issue 4; Other Information: (c) 2013 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
- Country of Publication:
- United States
- Language:
- English
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