Closely spaced nanomagnets by dual e-beam exposure for low-energy nanomagnet logic
- Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556 (United States)
The effect of nanomagnet spacing on required clock field has been studied by micromagnetic simulation for supermalloy (Ni{sub 79}Fe{sub 16}Mo{sub 5}) dots with dimensions 90 Multiplication-Sign 60 Multiplication-Sign 20 nm{sup 3} and 120 Multiplication-Sign 60 Multiplication-Sign 20 nm{sup 3}. Reduction of the inter-magnet spacing for both dimensions has resulted in reduction of the required clock field in the simulation. A dual e-beam exposure technique has been developed to allow fabrication of ultra dense features using conventional poly(methylmethacrylate) e-beam resist. Nanomagnet logic (NML) datalines of supermalloy dots with {approx}10 nm and {approx}15 nm spacing have been fabricated using dual e-beam exposure with a 3{sigma} overlay accuracy of {approx}4 nm. Fabricated NML datalines have been characterized using magnetic force microscopy for various clock fields. Datalines of both spacing have shown proper NML functionality with a clock field as low as 60 mT.
- OSTI ID:
- 22102395
- Journal Information:
- Journal of Applied Physics, Vol. 113, Issue 17; Conference: 55. annual conference on magnetism and magnetic materials, Atlanta, GA (United States), 14-18 Nov 2010; Other Information: (c) 2013 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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