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Title: As-grown deep-level defects in n-GaN grown by metal-organic chemical vapor deposition on freestanding GaN

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4748170· OSTI ID:22089424
; ;  [1]; ; ; ;  [2]; ; ;  [3]
  1. Nagoya University, Chikusa, Nagoya 464-8603 (Japan)
  2. Aichi Institute of Technology, Yakusa, Toyota 470-0392 (Japan)
  3. Toyota Central R and D Laboratories, Inc., Yokomichi, Nagakute 480-1192 (Japan)

Traps of energy levels E{sub c}-0.26 and E{sub c}-0.61 eV have been identified as as-grown traps in n-GaN grown by metal-organic chemical vapor deposition by using deep level transient spectroscopy of the Schottky contacts fabricated by resistive evaporation. The additional traps of E{sub c}-0.13 and E{sub c}-0.65 eV have been observed in samples whose contacts are deposited by electron-beam evaporation. An increase in concentration of the E{sub c}-0.13 and E{sub c}-0.65 eV traps when approaching the interface between the contact and the GaN film supports our argument that these traps are induced by electron-beam irradiation. Conversely, the depth profiles of as-grown traps show different profiles between several samples with increased or uniform distribution in the near surface below 50 nm. Similar profiles are observed in GaN grown on a sapphire substrate. We conclude that the growth process causes these large concentrations of as-grown traps in the near-surface region. It is speculated that the finishing step in the growth process should be an essential issue in the investigation of the surface state of GaN.

OSTI ID:
22089424
Journal Information:
Journal of Applied Physics, Vol. 112, Issue 5; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English