Numerical analysis of a mixture of Ar/NH{sub 3} microwave plasma chemical vapor deposition reactor
- School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024 (China)
- Chemistry Department, Anshan Normal University, Anshan 114007 (China)
A two-dimensional fluid model has been used to investigate the properties of plasma in Ar/NH{sub 3} microwave electron cyclotron resonance discharge at low pressure. The electromagnetic field model solved by the three-dimensional Simpson method is coupled to a fluid plasma model. The finite difference method was employed to discrete the governing equations. 40 species (neutrals, radicals, ions, and electrons) are consisted in the model. In total, 75 electron-neutral, 43 electron-ion, 167 neutral-neutral, 129 ion-neutral, 28 ion-ion, and 90 3-body reactions are used in the model. According to the simulation, the distribution of the densities of the considered plasma species has been showed and the mechanisms of their variations have been discussed. It is found that the main neutrals (Ar*, Ar**, NH{sub 3}{sup *}, NH, H{sub 2}, NH{sub 2}, H, and N{sub 2}) are present at high densities in Ar/NH{sub 3} microwave electron cyclotron resonance discharge when the mixing ratio of Ar/NH{sub 3} is 1:1 at 20 Pa. The density of NH is more than that of NH{sub 2} atom. And NH{sub 3}{sup +} are the most important ammonia ions. But the uniformity of the space distribution of NH{sub 3}{sup +} is lower than the other ammonia ions.
- OSTI ID:
- 22089226
- Journal Information:
- Journal of Applied Physics, Vol. 111, Issue 11; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Modeling of plasma chemistry in an atmospheric pressure Ar/NH{sub 3} cylindrical dielectric barrier discharge described using the one-dimensional fluid model
Cl{sub 2}/Ar and CH{sub 4}/H{sub 2}/Ar dry etching of III{endash}V nitrides
Related Subjects
AMMONIA
ARGON
ATOMS
CHEMICAL VAPOR DEPOSITION
DISTRIBUTION
ELECTROMAGNETIC FIELDS
ELECTRON CYCLOTRON-RESONANCE
FINITE DIFFERENCE METHOD
HIGH-FREQUENCY DISCHARGES
HYDROGEN
IONS
MICROWAVE RADIATION
MIXING RATIO
MIXTURES
NUMERICAL ANALYSIS
PLASMA DENSITY
PLASMA PRESSURE
PLASMA SIMULATION