Ion beams extraction and measurements of plasma parameters on a multi-frequencies microwaves large bore ECRIS with permanent magnets
- Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka Univ., 2-1 Yamadaoka, Suita-shi, Osaka, 565-0871 (Japan)
We have developed an all-permanent magnet large bore electron cyclotron resonance ion source (ECRIS) for broad ion beam processing. The cylindrically comb-shaped magnetic field configuration is adopted for efficient plasma production and good magnetic confinement. To compensate for disadvantages of fixed magnetic configuration, a traveling wave tube amplifier (TWTA) is used. In the comb-shaped ECRIS, it is difficult to achieve controlling ion beam profiles in the whole inside the chamber by using even single frequency-controllable TWTA (11-13GHz), because of large bore size with all-magnets. We have tried controlling profiles of plasma parameters and then those of extracted ion beams by launching two largely different frequencies simultaneously, i.e., multi-frequencies microwaves. Here we report ion beam profiles and corresponding plasma parameters under various experimental conditions, dependence of ion beams against extraction voltages, and influence of different electrode positions on the electron density profile.
- OSTI ID:
- 22075727
- Journal Information:
- AIP Conference Proceedings, Vol. 1496, Issue 1; Conference: 19. international conference on ion implantation technology, Valladolid (Spain), 25-29 Jun 2012; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
43 PARTICLE ACCELERATORS
AMPLIFIERS
BEAM EXTRACTION
BEAM PRODUCTION
BEAM PROFILES
BEAM-PLASMA SYSTEMS
ECR ION SOURCES
ELECTRIC POTENTIAL
ELECTRODES
ELECTRON DENSITY
ION BEAMS
MAGNETIC CONFINEMENT
MAGNETIC FIELD CONFIGURATIONS
MICROWAVE RADIATION
PERMANENT MAGNETS
PLASMA
PLASMA DENSITY
PLASMA DIAGNOSTICS
PLASMA PRODUCTION
RF SYSTEMS
TRAVELLING WAVE TUBES