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Title: Effect of target-substrate distance on properties of flexible InZnSnO films grown by linear facing target sputtering

Journal Article · · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
DOI:https://doi.org/10.1116/1.4705520· OSTI ID:22054161
; ;  [1]
  1. Information Materials and Device Laboratory (IMDL), Department of Advanced Materials Engineering for Information and Electronics, Kyung Hee University, 1 Seocheon-dong, Yongin-si, Gyeonggi-do 446-701 (Korea, Republic of)

The authors have investigated the effect of target-to-substrate distance (TSD) on the electrical, optical, and structural properties of flexible InZnSnO (IZTO) films grown on polyethylene terephthalate substrates using linear facing target sputtering (LFTS) at room temperature. The electrical and optical properties of IZTO film grown by LFTS were significantly influenced by TSD while the structural and surface properties of IZTO film were not affected by TSD, unlike conventional magnetron sputtering. Regardless of TSD, all IZTO film showed completely amorphous structure with very low root mean square roughness of 0.33 nm, due to the low kinetic energy of sputtered IZTO atoms and a substrate position that did not directly face the targets. Based on the figure of merit value, the optimized TSD for deposition of flexible IZTO films is 2.5 cm. At optimized conditions, the IZTO film showed a sheet resistance of 23.1 {Omega}/sq and an optical transmittance of 80%.

OSTI ID:
22054161
Journal Information:
Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 30, Issue 3; Other Information: (c) 2012 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
Country of Publication:
United States
Language:
English