Low temperature grown polycrystalline La{sub 0.7}Sr{sub 0.3}MnO{sub 3} thin films on amorphous SiO{sub 2} substrates by rf magnetron sputtering

Journal Article · Wed Jul 15 00:00:00 EDT 2009 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.3125265· OSTI ID:22053491

Choi, Sun Gyu; Sivasankar Reddy, A; Park, Hyung-Ho; Yang, Woo Seok; Ryu, Hojun; Yu, Byoung-Gon ^[1]

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1. Department of Materials Science and Engineering, Yonsei University, 134 Sinchon-dong, Seodaemun-ku, Seoul 120-749 (Korea, Republic of)

The La{sub 0.7}Sr{sub 0.3}MnO{sub 3} thin films have been prepared on amorphous SiO{sub 2} substrates by a rf magnetron sputtering technique under various oxygen flow rates and rf powers at a relatively low substrate temperature of 350 deg. C. The effects of oxygen flow rate and rf power on their physical properties were systematically investigated. X-ray diffraction results show that the growth orientation and crystallinity of the films were affected by rf power and oxygen flow rate. The electrical resistivity of the films was reduced with increasing oxygen flow rate and rf power due to enhanced {l_brace}100{r_brace} growth plane orientation and enlarged grain size of the films. In addition, a relatively high temperature coefficient of resistance value of -2.4% was obtained in the present investigation even with low deposition temperature.

• OSTI ID: 22053491
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 27, Issue 4; Other Information: (c) 2009 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CRYSTAL GROWTH
CRYSTAL STRUCTURE
DEPOSITION
GRAIN SIZE
LANTHANUM COMPOUNDS
MAGNETIC MATERIALS
MAGNETORESISTANCE
MANGANATES
ORIENTATION
OXYGEN
POLYCRYSTALS
SILICON OXIDES
SPUTTERING
STRONTIUM COMPOUNDS
SUBSTRATES
TEMPERATURE DEPENDENCE
THIN FILMS
X-RAY DIFFRACTION