Effects of pulsed sputtering frequency on the uniformity of Al:ZnO's transparent conductive oxide properties for solar cell applications
- Department of Materials Science and Engineering and Plasma Materials Research Center, Kunsan National University, Kunsan 573-701 (Korea, Republic of)
Bipolar pulsed magnetron sputtering is used to deposit Al doped ZnO (AZO) on a glass substrate for a transparent conducting oxide in a solar cell structure. A 5x25 in.{sup 2} AZO target was sputtered by 50-250 kHz bipolar pulsed dc power supply to deposit a 400x400 mm{sup 2} area by swinging back and forth. Sheet resistance, surface morphology, and optical transmittance were measured at different positions on 16 witness samples (small glass slides) to evaluate uniformity. In the thickness of 800 nm, the average value of sheet resistance was 30 {Omega}/{open_square} and the average resistivity was 2.1x10{sup -3} {Omega} cm. Transmittance was 50%-80% over the visible range. The nonuniformities of thickness, transmittance, and resistivity in the 400x400 mm{sup 2} area were 5.8%, 0.8%, and within 9.5%, respectively.
- OSTI ID:
- 22051050
- Journal Information:
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 27, Issue 6; Other Information: (c) 2009 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
- Country of Publication:
- United States
- Language:
- English
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