Extreme ultraviolet source at 6.7 nm based on a low-density plasma

Journal Article · Mon Nov 07 00:00:00 EST 2011 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.3660275· OSTI ID:22027801

Higashiguchi, Takeshi; Yugami, Noboru ^[1]; Otsuka, Takamitsu ^[1]; Jiang, Weihua ^[2]; Endo, Akira ^[3]; Bowen, Li; Kilbane, Deirdre; Dunne, Padraig; O'Sullivan, Gerry ^[4]

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1. Department of Advanced Interdisciplinary Sciences, Center for Optical Research and Education (CORE), and Optical Technology Innovation Center (OpTIC), Utsunomiya University, Yoto 7-1-2, Utsunomiya, Tochigi 321-8585 (Japan)
2. Department of Electrical Engineering, Nagaoka University of Technology, Kami-tomiokamachi 1603-1, Nagaoka, Niigata 940-2188 (Japan)
3. Research Institute for Science and Engineering, Waseda University, Okubo 3-4-1, Shinjuku, Tokyo 169-8555 (Japan)
4. School of Physics, University College Dublin, Belfield, Dublin 4 (Ireland)

We demonstrate an efficient extreme ultraviolet (EUV) source for operation at {lambda} = 6.7 nm by optimizing the optical thickness of gadolinium (Gd) plasmas. Using low initial density Gd targets and dual laser pulse irradiation, we observed a maximum EUV conversion efficiency (CE) of 0.54% for 0.6% bandwidth (BW) (1.8% for 2% BW), which is 1.6 times larger than the 0.33% (0.6% BW) CE produced from a solid density target. Enhancement of the EUV CE by use of a low-density plasma is attributed to the reduction of self-absorption effects.

• OSTI ID: 22027801
• Journal Information: Applied Physics Letters, Vol. 99, Issue 19; Other Information: (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
07 ISOTOPES AND RADIATION SOURCES
CONVERSION
EFFICIENCY
EXTREME ULTRAVIOLET RADIATION
GADOLINIUM
LASERS
LIGHT SOURCES
OPERATION
OPTIMIZATION
PLASMA
PLASMA DENSITY
PLASMA PRODUCTION
PULSED IRRADIATION
SELF-ABSORPTION