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Title: Chemical composition and thermal stability of GaAs oxides grown by AFM anodic oxidation for site-controlled growth of InAs quantum dots

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.3666343· OSTI ID:21612388
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  1. Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505 (Japan)

We have fabricated GaAs oxides by using atomic force microscope (AFM)-assisted anodic oxidation at various bias voltages, V{sub ox}, and studied their chemical compositions and thermal stabilities. The oxides grown at bias voltages less than 30 V desorbed after standard thermal cleaning in molecular beam epitaxy, while the oxide patterns fabricated at V{sub ox}{>=}40 V survived on the surface. We have further investigated the chemical composition of the oxides by X-ray photoemission spectroscopy. It has been found that the AFM oxides grown at V{sub ox}{approx}10 V predominantly consist of Ga{sub 2}O and GaO, whereas those grown at V{sub ox}{approx}50 V contain a Ga{sub 2}O{sub 3}-component. This result indicates that the better thermal stability of AFM oxides grown at V{sub ox}{>=}40 V can be attributed to the formation of Ga{sub 2}O{sub 3}. We grew a GaAs buffer layer on the oxide nanomasks and obtained nanoholes. After supplying InAs, selective dot nucleation took place in the nanoholes, resulting in successful formation of site-controlled QDs.

OSTI ID:
21612388
Journal Information:
AIP Conference Proceedings, Vol. 1399, Issue 1; Conference: 30. international conference on the physics of semiconductors, Seoul (Korea, Republic of), 25-30 Jul 2010; Other Information: DOI: 10.1063/1.3666343; (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English