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Title: Specific features of the mechanisms of excitation of erbium photoluminescence in epitaxial Si:Er/Si structures

Journal Article · · Semiconductors
; ;  [1];  [2];  [1]
  1. Russian Academy of Sciences, Institute of Physics of Microstructures (Russian Federation)
  2. Nizhni Novgorod State University, Physicotechnical Research Institute (Russian Federation)

The excitation spectra and kinetics of erbium photoluminescence and silicon interband photoluminescence in Si:Er/Si structures under conditions of high-intensity pulse optical excitation are studied. It is shown that, in the interband photoluminescence spectra of the Si:Er/Si structures, both the luminescence of free excitons and the emission associated with the electron-hole plasma can be observed, depending on the excitation power and wavelength. It is found that the formation of a peak in the erbium photoluminescence excitation spectra at high pumping powers correlates with the Mott transition from the exciton gas to the electron-hole plasma. It is demonstrated that, in the Si:Er/Si structures, the characteristic rise times of erbium photoluminescence substantially depend on the concentration of charge carriers.

OSTI ID:
21562178
Journal Information:
Semiconductors, Vol. 44, Issue 11; Other Information: DOI: 10.1134/S1063782610110187; Copyright (c) 2010 Pleiades Publishing, Ltd.; ISSN 1063-7826
Country of Publication:
United States
Language:
English