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Title: Magnetic properties of ion implanted Ge{sub 1-x}Mn{sub x} thin films solidified through pulsed laser melting

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3590137· OSTI ID:21560231
 [1]; ; ;  [2]; ; ; ;  [3];  [1]
  1. Department of Physics, University of Virginia, Charlottesville, Virginia 22904 (United States)
  2. Harvard School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138 (United States)
  3. Department of Materials Science and Engineering, University of Virginia, Charlottesville, Virginia 22904 (United States)

Ge{sub 1-x}Mn{sub x} thin films with an average Mn concentration of 0.64 at. % were fabricated through Mn ion implantation into crystalline germanium-on-insulator wafers. Implantation damage was removed and crystallinity restored by pulsed laser melting from a single 30-ns 308-nm XeCl{sup +} excimer laser pulse. Resolidified films demonstrated higher Curie temperatures but smaller saturation magnetizations than those of both as-implanted films and implanted films subjected to rapid thermal annealing. These findings are attributed to the redistribution of Mn during solidification.

OSTI ID:
21560231
Journal Information:
Journal of Applied Physics, Vol. 109, Issue 9; Other Information: DOI: 10.1063/1.3590137; (c) 2011 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English