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Title: Photoemission study of praseodymia in its highest oxidation state: The necessity of in situ plasma treatment

Journal Article · · Journal of Chemical Physics
DOI:https://doi.org/10.1063/1.3516953· OSTI ID:21559998
; ;  [1]; ;  [2];  [3];  [4]
  1. Institute of Applied and Physical Chemistry, University of Bremen, Leobener Str. NW2, D-28359 Bremen (Germany)
  2. Department of Physics, University of Osnabrueck, Barbarastr. 7, D-49069 Osnabrueck (Germany)
  3. IHP, Im Technologiepark 25, D-15236 Frankfurt (Oder) (Germany)
  4. Institute of Solid State Physics, University of Bremen, P.O. Box 330440, D-28334 Bremen (Germany)

A cold radio frequency oxygen plasma treatment is demonstrated as a successful route to prepare clean, well-ordered, and stoichiometric PrO{sub 2} layers on silicon. High structural quality of these layers is shown by x-ray diffraction. So far unobserved spectral characteristics in Pr 3d x-ray photoelectron (XP) spectra of PrO{sub 2} are presented as a fingerprint for praseodymia in its highest oxidized state. They provide insight in the electronic ground state and the special role of praseodymia among the rare earth oxides. They also reveal that former XP studies suffered from a significant reduction at the surface.

OSTI ID:
21559998
Journal Information:
Journal of Chemical Physics, Vol. 134, Issue 5; Other Information: DOI: 10.1063/1.3516953; (c) 2011 American Institute of Physics; ISSN 0021-9606
Country of Publication:
United States
Language:
English

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