Effects of gas pressure on 60/13.56 MHz dual-frequency capacitively coupled plasmas
- Key Laboratory of Atomic and Molecular Physics and Functional Materials of Gansu Province, College of Physics and Electronic Engineering, Northwest Normal University, Lanzhou 730070 (China)
- School of Physical Science and Technology, Suzhou University, SuZhou 215006 (China)
The electron energy probability functions (EEPFs) were measured with increasing gas pressure in 60/13.56 MHz dual-frequency capacitively coupled plasma (DF-CCP) using compensated Langmiur electrostatic probe. The transition pressure of heating mode from collisionless to collisional heating in 60/13.56 MHz DF-CCP is found to be significantly lower than that in 13.56 MHz single-frequency CCP. As the pressure increases, the EEPFs change from bi-Maxwellian to Druyvesteyn type which is similar with that in 60 MHz single-frequency CCP. The pressure dependence of electron densities, effective electron temperatures, floating potentials, and plasma potentials in 60/13.56 MHz DF-CCP were measured and were compared with that in 60 MHz single-frequency CCP. The pressure dependence of these plasma parameters in 60/13.56 MHz DF-CCP is similar with that in 60 MHz single-frequency CCP.
- OSTI ID:
- 21537832
- Journal Information:
- Physics of Plasmas, Vol. 18, Issue 5; Other Information: DOI: 10.1063/1.3587108; (c) 2011 American Institute of Physics; ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
COLLISIONAL HEATING
ELECTRON DENSITY
ELECTRON TEMPERATURE
ELECTROSTATIC PROBES
HIGH-FREQUENCY DISCHARGES
LANGMUIR PROBE
PLASMA POTENTIAL
PLASMA PRESSURE
PRESSURE DEPENDENCE
ELECTRIC DISCHARGES
ELECTRIC POTENTIAL
ELECTRIC PROBES
HEATING
HIGH-FREQUENCY HEATING
MAGNETIC-PUMPING HEATING
PLASMA HEATING
PROBES