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Title: Nanostructured carbon films with oriented graphitic planes

Abstract

Nanostructured carbon films with oriented graphitic planes can be deposited by applying energetic carbon bombardment. The present work shows the possibility of structuring graphitic planes perpendicular to the substrate in following two distinct ways: (i) applying sufficiently large carbon energies for deposition at room temperature (E>10 keV), (ii) utilizing much lower energies for deposition at elevated substrate temperatures (T>200 deg. C). High resolution transmission electron microscopy is used to probe the graphitic planes. The alignment achieved at elevated temperatures does not depend on the deposition angle. The data provides insight into the mechanisms leading to the growth of oriented graphitic planes under different conditions.

Authors:
;  [1];  [2];  [3];  [1]
  1. Solid State Institute, Technion, Israel Institute of Technology, Haifa 32000 (Israel)
  2. Materials Research Institute, Penn State University, University Park, PA 16208 (United States)
  3. Department of Materials Engineering, Technion, Israel Institute of Technology, Haifa 32000 (Israel)
Publication Date:
OSTI Identifier:
21518342
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 98; Journal Issue: 12; Other Information: DOI: 10.1063/1.3570625; (c) 2011 American Institute of Physics; Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; CARBON; DEPOSITION; GRAPHITE; GROWTH; ION BEAMS; KEV RANGE; MATERIALS; NANOSTRUCTURES; RESOLUTION; SUBSTRATES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; BEAMS; ELECTRON MICROSCOPY; ELEMENTS; ENERGY RANGE; FILMS; MICROSCOPY; MINERALS; NONMETALS; TEMPERATURE RANGE

Citation Formats

Teo, E H. T., Kalish, R, Kulik, J, Kauffmann, Y, Lifshitz, Y, and Department of Materials Engineering, Technion, Israel Institute of Technology, Haifa 32000. Nanostructured carbon films with oriented graphitic planes. United States: N. p., 2011. Web. doi:10.1063/1.3570625.
Teo, E H. T., Kalish, R, Kulik, J, Kauffmann, Y, Lifshitz, Y, & Department of Materials Engineering, Technion, Israel Institute of Technology, Haifa 32000. Nanostructured carbon films with oriented graphitic planes. United States. https://doi.org/10.1063/1.3570625
Teo, E H. T., Kalish, R, Kulik, J, Kauffmann, Y, Lifshitz, Y, and Department of Materials Engineering, Technion, Israel Institute of Technology, Haifa 32000. 2011. "Nanostructured carbon films with oriented graphitic planes". United States. https://doi.org/10.1063/1.3570625.
@article{osti_21518342,
title = {Nanostructured carbon films with oriented graphitic planes},
author = {Teo, E H. T. and Kalish, R and Kulik, J and Kauffmann, Y and Lifshitz, Y and Department of Materials Engineering, Technion, Israel Institute of Technology, Haifa 32000},
abstractNote = {Nanostructured carbon films with oriented graphitic planes can be deposited by applying energetic carbon bombardment. The present work shows the possibility of structuring graphitic planes perpendicular to the substrate in following two distinct ways: (i) applying sufficiently large carbon energies for deposition at room temperature (E>10 keV), (ii) utilizing much lower energies for deposition at elevated substrate temperatures (T>200 deg. C). High resolution transmission electron microscopy is used to probe the graphitic planes. The alignment achieved at elevated temperatures does not depend on the deposition angle. The data provides insight into the mechanisms leading to the growth of oriented graphitic planes under different conditions.},
doi = {10.1063/1.3570625},
url = {https://www.osti.gov/biblio/21518342}, journal = {Applied Physics Letters},
issn = {0003-6951},
number = 12,
volume = 98,
place = {United States},
year = {Mon Mar 21 00:00:00 EDT 2011},
month = {Mon Mar 21 00:00:00 EDT 2011}
}