Defects in low-k organosilicate glass and their response to processing as measured with electron-spin resonance
- Department of Electrical and Computer Engineering, Plasma Processing and Technology Laboratory, University of Wisconsin-Madison, Madison, Wisconsin 53706 (United States)
- Novellus Systems, Tualatin, Oregon 97062 (United States)
- Novellus Systems, Albany, New York 12203 (United States)
- Stanford University, Stanford, California 94305 (United States)
Defect concentrations in low-k organosilicate glass films deposited on high-resistivity silicon were measured with electron-spin resonance. Bulk dangling bonds were detected. Both plasma exposure and ultraviolet exposure were used. During argon electron cyclotron resonance plasma exposure, ion and photon bombardment increased the measured defect concentrations. Ultraviolet lamp exposure was also shown to increase the defect concentrations. Dielectric samples with various dielectric constants were examined showing that as the value of the dielectric constant was lowered, the defect concentrations were shown to increase significantly.
- OSTI ID:
- 21518315
- Journal Information:
- Applied Physics Letters, Vol. 98, Issue 10; Other Information: DOI: 10.1063/1.3562307; (c) 2011 American Institute of Physics; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CHEMICAL VAPOR DEPOSITION
DEFECTS
DIELECTRIC MATERIALS
ELECTRON CYCLOTRON-RESONANCE
ELECTRON SPIN RESONANCE
GLASS
IONS
ORGANIC COMPOUNDS
PARAMAGNETISM
PERMITTIVITY
PLASMA
PROCESSING
SILICON
THIN FILMS
ULTRAVIOLET RADIATION
CHARGED PARTICLES
CHEMICAL COATING
CYCLOTRON RESONANCE
DEPOSITION
DIELECTRIC PROPERTIES
ELECTRICAL PROPERTIES
ELECTROMAGNETIC RADIATION
ELEMENTS
FILMS
MAGNETIC RESONANCE
MAGNETISM
MATERIALS
PHYSICAL PROPERTIES
RADIATIONS
RESONANCE
SEMIMETALS
SURFACE COATING
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CHEMICAL VAPOR DEPOSITION
DEFECTS
DIELECTRIC MATERIALS
ELECTRON CYCLOTRON-RESONANCE
ELECTRON SPIN RESONANCE
GLASS
IONS
ORGANIC COMPOUNDS
PARAMAGNETISM
PERMITTIVITY
PLASMA
PROCESSING
SILICON
THIN FILMS
ULTRAVIOLET RADIATION
CHARGED PARTICLES
CHEMICAL COATING
CYCLOTRON RESONANCE
DEPOSITION
DIELECTRIC PROPERTIES
ELECTRICAL PROPERTIES
ELECTROMAGNETIC RADIATION
ELEMENTS
FILMS
MAGNETIC RESONANCE
MAGNETISM
MATERIALS
PHYSICAL PROPERTIES
RADIATIONS
RESONANCE
SEMIMETALS
SURFACE COATING