Improved epitaxy of ultrathin praseodymia films on chlorine passivated Si(111) reducing silicate interface formation
- Department of Physics, University of Osnabrueck, Barbarastrasse 7, D-49069 Osnabrueck (Germany)
- Institute of Solid State Physics, University of Bremen, Otto-Hahn-Allee 1, D-28359 Bremen (Germany)
Ultrathin praseodymia films have been deposited on both Cl-passivated and nonpassivated Si(111) substrates by molecular beam epitaxy. Comparative studies on the crystallinity and stoichiometry are performed by x-ray photoelectron spectroscopy, x-ray standing waves, and x-ray reflectometry. On nonpassivated Si(111) an amorphous silicate film is formed. In contrast, praseodymia deposited on Cl-passivated Si(111) form a well-ordered crystalline film with cubic-Pr{sub 2}O{sub 3} (bixbyite) structure. The vertical lattice constant of the praseodymia film is increased by 1.4% compared to the bulk value. Furthermore, the formation of an extended amorphous silicate interface layers is suppressed and confined to only one monolayer.
- OSTI ID:
- 21518210
- Journal Information:
- Applied Physics Letters, Vol. 97, Issue 24; Other Information: DOI: 10.1063/1.3525175; (c) 2010 American Institute of Physics; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
CHLORINE
CRYSTAL GROWTH
INTERFACES
LATTICE PARAMETERS
LAYERS
MOLECULAR BEAM EPITAXY
PRASEODYMIUM OXIDES
SILICATES
SILICON
STANDING WAVES
STOICHIOMETRY
SUBSTRATES
THIN FILMS
X RADIATION
X-RAY PHOTOELECTRON SPECTROSCOPY
CHALCOGENIDES
CRYSTAL GROWTH METHODS
ELECTROMAGNETIC RADIATION
ELECTRON SPECTROSCOPY
ELEMENTS
EPITAXY
FILMS
HALOGENS
IONIZING RADIATIONS
NONMETALS
OXIDES
OXYGEN COMPOUNDS
PHOTOELECTRON SPECTROSCOPY
PRASEODYMIUM COMPOUNDS
RADIATIONS
RARE EARTH COMPOUNDS
SEMIMETALS
SILICON COMPOUNDS
SPECTROSCOPY