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Title: Effect of high Xe-concentration in a plasma display panel with a SrCaO cold cathode

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3372612· OSTI ID:21476242
; ;  [1];  [2];  [3]
  1. Graduate School of Advanced Science of Matter, Hiroshima University, Higashi-Hiroshima 739-8530 (Japan)
  2. Graduate School of Science and Engineering, Tokyo Metropolitan University, Hachioji 192-0397 (Japan)
  3. Advanced PDP Development Center Corporation, Ibaraki 567-0026 (Japan)

We present here measurements of high Xe-contents plasma display panel (PDP) with SrCaO cold cathode. Luminous efficacy ({eta}) shows a two-step increase with Xe-concentration in Ne/Xe gas mixture: {eta} drastically increases up to Xe-concentration of 30% (Xe: 30%), and then attains 5 lm/W at the highest Xe-concentration of Xe: 100%. The high performance PDP with Xe: 100% can be operated at low applied voltage between 230 and 377 V due to the high secondary electron emission from the SrCaO cathode. Emission measurements clearly show the change in discharge characteristics at Xe: 30%, where the discharge changes from a Ne/Xe mixture discharge to an almost pure Xe discharge, and the vacuum ultraviolet (VUV) radiation from the combination of resonance and excimer radiations to only excimer radiation. Theoretical analysis solving Boltzmann equation for electron demonstrates that increasing Xe-concentration enhances the collision frequency for electron impact excitation directly from ground state to lower levels concerned with the VUV radiation, resulting in a drastic increase in luminous efficacy up to Xe: 30%. Also, one-dimensional fluid simulation of a Ne/Xe dielectric barrier discharge clearly shows that a combination of high secondary electron emission cathode and high Xe-concentration is quite effective for high VUV radiation efficiency because it induces a drastic increase in electron-heating efficiency.

OSTI ID:
21476242
Journal Information:
Journal of Applied Physics, Vol. 107, Issue 10; Other Information: DOI: 10.1063/1.3372612; (c) 2010 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English