Effect of Reactive Sputtering Parameters on TiAlN Nanocoating Structure and Morphology
- Jurusan Fisika FMIPA Universitas Negeri Jakarta Jl. Pemuda No. 10 Rawamangun Jakarta 13220 (Indonesia)
- Faculty of Manufacturing Engineering Universiti Teknikal Malaysia Melaka (UTeM) Karung Berkunci No 1752 Pejabat Pos Durian Tunggal 76109 Melaka (Malaysia)
The effect of substrate bias and nitrogen flow rate on the TiAlN nanocoating structure and morphology has been investigated by using reactive unbalance DC magnetron sputtering. TiAlN nanocoating was deposited on the tungsten carbide insert tool and the structure and morphology were characterized by using XRD and AFM, respectively. The substrate bias was varied between 0 to -221 V and the nitrogen flow rate was varied between 30 to 72 sccm. The results showed that the structure of TiAlN nanocoating consisted of mainly (111) and (200) plane. The structure was significatly influenced by substrate bias in promoting finer crystal size and increased crystal plane spacing while the rms roughness of nanocoating was influenced by substrate bias and nitrogen flow rate.
- OSTI ID:
- 21428665
- Journal Information:
- AIP Conference Proceedings, Vol. 1284, Issue 1; Conference: NNSB2010: 3. nanoscience and nanotechnology symposium 2010, Bandung (Indonesia), 16 Jun 2010; Other Information: DOI: 10.1063/1.3515531; (c) 2010 American Institute of Physics; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
ALUMINIUM NITRIDES
ATOMIC FORCE MICROSCOPY
COATINGS
CRYSTALS
FLOW RATE
MORPHOLOGY
NANOSTRUCTURES
NITROGEN
ROUGHNESS
SPUTTERING
SUBSTRATES
TITANIUM NITRIDES
TUNGSTEN CARBIDES
X-RAY DIFFRACTION
ALUMINIUM COMPOUNDS
CARBIDES
CARBON COMPOUNDS
COHERENT SCATTERING
DIFFRACTION
ELEMENTS
MICROSCOPY
NITRIDES
NITROGEN COMPOUNDS
NONMETALS
PNICTIDES
REFRACTORY METAL COMPOUNDS
SCATTERING
SURFACE PROPERTIES
TITANIUM COMPOUNDS
TRANSITION ELEMENT COMPOUNDS
TUNGSTEN COMPOUNDS