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Title: Effect of Reactive Sputtering Parameters on TiAlN Nanocoating Structure and Morphology

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.3515531· OSTI ID:21428665
 [1]; ;  [2]
  1. Jurusan Fisika FMIPA Universitas Negeri Jakarta Jl. Pemuda No. 10 Rawamangun Jakarta 13220 (Indonesia)
  2. Faculty of Manufacturing Engineering Universiti Teknikal Malaysia Melaka (UTeM) Karung Berkunci No 1752 Pejabat Pos Durian Tunggal 76109 Melaka (Malaysia)

The effect of substrate bias and nitrogen flow rate on the TiAlN nanocoating structure and morphology has been investigated by using reactive unbalance DC magnetron sputtering. TiAlN nanocoating was deposited on the tungsten carbide insert tool and the structure and morphology were characterized by using XRD and AFM, respectively. The substrate bias was varied between 0 to -221 V and the nitrogen flow rate was varied between 30 to 72 sccm. The results showed that the structure of TiAlN nanocoating consisted of mainly (111) and (200) plane. The structure was significatly influenced by substrate bias in promoting finer crystal size and increased crystal plane spacing while the rms roughness of nanocoating was influenced by substrate bias and nitrogen flow rate.

OSTI ID:
21428665
Journal Information:
AIP Conference Proceedings, Vol. 1284, Issue 1; Conference: NNSB2010: 3. nanoscience and nanotechnology symposium 2010, Bandung (Indonesia), 16 Jun 2010; Other Information: DOI: 10.1063/1.3515531; (c) 2010 American Institute of Physics; ISSN 0094-243X
Country of Publication:
United States
Language:
English