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Title: High Spatial Resolution STXM at 6.2 keV Photon Energy

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.3399261· OSTI ID:21371773
; ; ; ; ; ; ;  [1]; ;  [2]; ; ;  [3]
  1. Paul Scherrer Institut, CH-5232 Villigen (Switzerland)
  2. Technische Universitaet Muenchen, D-85748 Garching (Germany)
  3. Department of Chemistry, FI-00014 University of Helsinki (Finland)

We report on a zone-doubling technique that bypasses the electron-beam lithography limitations for the production of X-ray diffractive optics and enables the fabrication of Fresnel zone plates with smaller outermost zone widths than other well-established approaches. We have applied this method to manufacture hard X-ray Fresnel zone plates with outermost zone widths of 25 and 20 nm. These lenses have been tested in scanning transmission X-ray microscopy (STXM) at energies up to 6.2 keV, producing images of test structures that demonstrate a spatial resolution of 25 nm. High spatial resolution STXM images of several biological specimens have been acquired in transmission, dark-field and differential phase contrast modes.

OSTI ID:
21371773
Journal Information:
AIP Conference Proceedings, Vol. 1221, Issue 1; Conference: 20. international congress on X-ray optics and microanalysis, Karlsruhe (Germany), 15-18 Sep 2009; Other Information: DOI: 10.1063/1.3399261; (c) 2010 American Institute of Physics; ISSN 0094-243X
Country of Publication:
United States
Language:
English