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Title: Origin of the butterfly-shaped magnetoresistance in reactive sputtered epitaxial Fe{sub 3}O{sub 4} films

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3187537· OSTI ID:21359360
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  1. Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Institute of Advanced Materials Physics, Faculty of Science, Tianjin University, Tianjin 300072 (China)

Epitaxial Fe{sub 3}O{sub 4} thin films were synthesized by facing-target reactive sputtering Fe targets. The epitaxy of the Fe{sub 3}O{sub 4} film on MgO (100) was examined macroscopically using x-ray diffraction, including conventional theta-2theta scan, tilting 2theta scan, phi scan, and pole figure. The observed low-field butterfly-shaped magnetoresistance (MR) are explained by the primary fast rotation of the spins far away from antiphase boundaries and the high-field MR changing linearly with magnetic field can be understood by the gradual rotation of the spins near the antiphase boundaries. It is magnetocrystalline anisotropy that causes an increase in MR below Verwey transition temperature.

OSTI ID:
21359360
Journal Information:
Journal of Applied Physics, Vol. 106, Issue 3; Other Information: DOI: 10.1063/1.3187537; (c) 2009 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English