High accuracy subwavelength distance measurements: A variable-angle standing-wave total-internal-reflection optical microscope
Abstract
We describe an extension of the total-internal-reflection microscopy technique that permits direct in-plane distance measurements with high accuracy (<10 nm) over a wide range of separations. This high position accuracy arises from the creation of a standing evanescent wave and the ability to sweep the nodal positions (intensity minima of the standing wave) in a controlled manner via both the incident angle and the relative phase of the incoming laser beams. Some control over the vertical resolution is available through the ability to scan the incoming angle and with it the evanescent penetration depth.
- Authors:
-
- Department of Physics and Astronomy, Northwestern University, Evanston, Illinois 60208 (United States)
- Publication Date:
- OSTI Identifier:
- 21356123
- Resource Type:
- Journal Article
- Journal Name:
- Journal of Applied Physics
- Additional Journal Information:
- Journal Volume: 105; Journal Issue: 8; Other Information: DOI: 10.1063/1.3116561; (c) 2009 American Institute of Physics; Journal ID: ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; OPTICAL MICROSCOPES; OPTICAL MICROSCOPY; PENETRATION DEPTH; REFLECTION; RESOLUTION; STANDING WAVES; MICROSCOPES; MICROSCOPY
Citation Formats
Haynie, A, Min, T -J, Luan, L, Materials Research Center, Northwestern University, Evanston, Illinois 60208, Mu, W, Nanoscience Learning and Teaching Center, Northwestern University, Evanston, Illinois 60208, Ketterson, J B, Materials Research Center, Northwestern University, Evanston, Illinois 60208, Nanoscience Learning and Teaching Center, Northwestern University, Evanston, Illinois 60208, and Department of Electrical and Computer Engineering, Northwestern University, Evanston, Illinois 60208. High accuracy subwavelength distance measurements: A variable-angle standing-wave total-internal-reflection optical microscope. United States: N. p., 2009.
Web. doi:10.1063/1.3116561.
Haynie, A, Min, T -J, Luan, L, Materials Research Center, Northwestern University, Evanston, Illinois 60208, Mu, W, Nanoscience Learning and Teaching Center, Northwestern University, Evanston, Illinois 60208, Ketterson, J B, Materials Research Center, Northwestern University, Evanston, Illinois 60208, Nanoscience Learning and Teaching Center, Northwestern University, Evanston, Illinois 60208, & Department of Electrical and Computer Engineering, Northwestern University, Evanston, Illinois 60208. High accuracy subwavelength distance measurements: A variable-angle standing-wave total-internal-reflection optical microscope. United States. https://doi.org/10.1063/1.3116561
Haynie, A, Min, T -J, Luan, L, Materials Research Center, Northwestern University, Evanston, Illinois 60208, Mu, W, Nanoscience Learning and Teaching Center, Northwestern University, Evanston, Illinois 60208, Ketterson, J B, Materials Research Center, Northwestern University, Evanston, Illinois 60208, Nanoscience Learning and Teaching Center, Northwestern University, Evanston, Illinois 60208, and Department of Electrical and Computer Engineering, Northwestern University, Evanston, Illinois 60208. 2009.
"High accuracy subwavelength distance measurements: A variable-angle standing-wave total-internal-reflection optical microscope". United States. https://doi.org/10.1063/1.3116561.
@article{osti_21356123,
title = {High accuracy subwavelength distance measurements: A variable-angle standing-wave total-internal-reflection optical microscope},
author = {Haynie, A and Min, T -J and Luan, L and Materials Research Center, Northwestern University, Evanston, Illinois 60208 and Mu, W and Nanoscience Learning and Teaching Center, Northwestern University, Evanston, Illinois 60208 and Ketterson, J B and Materials Research Center, Northwestern University, Evanston, Illinois 60208 and Nanoscience Learning and Teaching Center, Northwestern University, Evanston, Illinois 60208 and Department of Electrical and Computer Engineering, Northwestern University, Evanston, Illinois 60208},
abstractNote = {We describe an extension of the total-internal-reflection microscopy technique that permits direct in-plane distance measurements with high accuracy (<10 nm) over a wide range of separations. This high position accuracy arises from the creation of a standing evanescent wave and the ability to sweep the nodal positions (intensity minima of the standing wave) in a controlled manner via both the incident angle and the relative phase of the incoming laser beams. Some control over the vertical resolution is available through the ability to scan the incoming angle and with it the evanescent penetration depth.},
doi = {10.1063/1.3116561},
url = {https://www.osti.gov/biblio/21356123},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 8,
volume = 105,
place = {United States},
year = {Wed Apr 15 00:00:00 EDT 2009},
month = {Wed Apr 15 00:00:00 EDT 2009}
}
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