Correlation Analysis of Waves above a Capacitive Plasma Applicator

Journal Article · Fri Jul 24 00:00:00 EDT 2009 · Physical Review Letters

DOI:https://doi.org/10.1103/PHYSREVLETT.103.045003· OSTI ID:21347088

Gekelman, W; Vincena, S; Pribyl, P ^[1]; Barnes, M ^[2]

---

1. Department of Physics and Astronomy, University of California, Los Angeles, California (United States)
2. Intevac Corporation, Santa Clara, California (United States)

Capacitively coupled plasma glow discharges have been extensively used for materials processing in numerous industrial applications. Considerable research has been performed on plasma sheaths and standing waves over a capacitive applicator, which typically holds the processed substrate (e.g., a semiconductor wafer). In this work, we demonstrate for the first time the existence of normal modes in electric potential analogous to the vibrational modes in circular membranes and plates. These modes are exhibited through cross spectral analysis of the plasma potential measured with an emissive probe at 208 spatial positions and sampled at 1 GHz. These modes exist at several frequencies and are described by a series of Bessel functions. The data further suggests a nonlinear interaction between modes of different frequencies.

• OSTI ID: 21347088
• Journal Information: Physical Review Letters, Vol. 103, Issue 4; Other Information: DOI: 10.1103/PhysRevLett.103.045003; (c) 2009 The American Physical Society; ISSN 0031-9007
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
BESSEL FUNCTIONS
CORRELATIONS
GLOW DISCHARGES
MEMBRANES
NONLINEAR PROBLEMS
PLASMA
PLASMA POTENTIAL
PLASMA SHEATH
SEMICONDUCTOR MATERIALS
STANDING WAVES
SUBSTRATES
ELECTRIC DISCHARGES
ELECTRIC POTENTIAL
FUNCTIONS
MATERIALS