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Title: A Breakdown Criterion of Free Molecular Flows and an Optimum Analysis of EBPVD

Abstract

Two important issues in electron beam physical vapor deposition (EBPVD) are addressed. The first issue is a validity condition of the classical cosine law widely used in the engineering context. This requires a breakdown criterion of the free molecular assumption on which the cosine law is established. Using the analytical solution of free molecular effusion flow, the number of collisions (N{sub c}) for a particle moving from an evaporative source to a substrate is estimated that is proven inversely proportional to the local Knudsen number at the evaporation surface. N{sub c} = 1 is adopted as a breakdown criterion of the free molecular assumption, and it is verified by experimental data and DSMC results. The second issue is how to realize the uniform distributions of thickness and component over a large-area thin film. Our analysis shows that at relatively low evaporation rates the goal is easy achieved through arranging the evaporative source positions properly and rotating the substrate.

Authors:
; ;  [1]
  1. Laboratory of High Temperature Gas Dynamics, Institute of Mechanics, Chinese Academy of Sciences, Beijing, China 100190 (China)
Publication Date:
OSTI Identifier:
21254954
Resource Type:
Journal Article
Journal Name:
AIP Conference Proceedings
Additional Journal Information:
Journal Volume: 1084; Journal Issue: 1; Conference: 26. international symposium on rarified gas dynamics, Kyoto (Japan), 20-25 Jul 2008; Other Information: DOI: 10.1063/1.3076446; (c) 2009 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ANALYTICAL SOLUTION; DIFFUSION; DISTRIBUTION; ELECTRON BEAMS; EVAPORATION; KNUDSEN FLOW; MOLECULAR DYNAMICS METHOD; MOLECULE COLLISIONS; PHYSICAL VAPOR DEPOSITION; SUBSTRATES; THIN FILMS; VAPORS

Citation Formats

Shuaihui, Li, Jing, Fan, and Yonghua, Shu. A Breakdown Criterion of Free Molecular Flows and an Optimum Analysis of EBPVD. United States: N. p., 2008. Web. doi:10.1063/1.3076446.
Shuaihui, Li, Jing, Fan, & Yonghua, Shu. A Breakdown Criterion of Free Molecular Flows and an Optimum Analysis of EBPVD. United States. https://doi.org/10.1063/1.3076446
Shuaihui, Li, Jing, Fan, and Yonghua, Shu. 2008. "A Breakdown Criterion of Free Molecular Flows and an Optimum Analysis of EBPVD". United States. https://doi.org/10.1063/1.3076446.
@article{osti_21254954,
title = {A Breakdown Criterion of Free Molecular Flows and an Optimum Analysis of EBPVD},
author = {Shuaihui, Li and Jing, Fan and Yonghua, Shu},
abstractNote = {Two important issues in electron beam physical vapor deposition (EBPVD) are addressed. The first issue is a validity condition of the classical cosine law widely used in the engineering context. This requires a breakdown criterion of the free molecular assumption on which the cosine law is established. Using the analytical solution of free molecular effusion flow, the number of collisions (N{sub c}) for a particle moving from an evaporative source to a substrate is estimated that is proven inversely proportional to the local Knudsen number at the evaporation surface. N{sub c} = 1 is adopted as a breakdown criterion of the free molecular assumption, and it is verified by experimental data and DSMC results. The second issue is how to realize the uniform distributions of thickness and component over a large-area thin film. Our analysis shows that at relatively low evaporation rates the goal is easy achieved through arranging the evaporative source positions properly and rotating the substrate.},
doi = {10.1063/1.3076446},
url = {https://www.osti.gov/biblio/21254954}, journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 1084,
place = {United States},
year = {Wed Dec 31 00:00:00 EST 2008},
month = {Wed Dec 31 00:00:00 EST 2008}
}