Dust Successive Generations in Ar/SiH{sub 4} : Dust Cloud Dynamics
Journal Article
·
· AIP Conference Proceedings
- GREMI, CNRS-Universite d'Orleans, 14 rue dIssoudun, BP 6744, 45067 Orleans cedex 2 (France)
Silane-based plasmas are widely used to deposit nanostructured silicon thin films or to synthesize silicon nanoparticles. Dust particle formation in Ar/SiH{sub 4} plasmas is a continuous phenomenon: as long as silane precursors are provided, new dust generations are formed. Successive generations can be monitored thanks to various electrical (V{sub dc}/3H) and optical (OES, video imaging) diagnostics. Experiments presented in this paper have been performed in a capacitively-coupled radiofrequency discharge, at low pressure (12 Pa) in an Argon/Silane mixture (92:8)
- OSTI ID:
- 21251278
- Journal Information:
- AIP Conference Proceedings, Vol. 1041, Issue 1; Conference: 5. international conference on the physics of dusty plasmas, Ponta Degada, Azores (Portugal), 18-23 May 2008; Other Information: DOI: 10.1063/1.2997132; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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