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Title: Improved optical and electrical properties of rf sputtered Al doped ZnO films on polymer substrates by low-damage processes

Journal Article · · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
DOI:https://doi.org/10.1116/1.3081966· OSTI ID:21195009
; ;  [1]
  1. Materials Science and Technology Research Division, Korea Institute of Science and Technology, Seoul 136-791 (Korea, Republic of)

Three types of low-damage radio-frequency (rf) magnetron sputtering processes--an interruptive process, a rotating cylindrical holder method, and an off-axis sputtering method--were designed and studied to reduce the film surface temperature during deposition. Low-damage sputtering processes were investigated to improve the resistivity and optical transmittance in the visible range of Al doped ZnO (AZO) thin films deposited on polymer substrates. In the case of the polyethersulfone substrate, AZO films with a resistivity of 1.0x10{sup -3} {omega} cm and an optical transmittance of 75% were obtained by the rotating repeat holder method during rf sputtering.

OSTI ID:
21195009
Journal Information:
Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 27, Issue 2; Other Information: DOI: 10.1116/1.3081966; (c) 2009 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
Country of Publication:
United States
Language:
English