Study of fluorocarbon plasma in 60 and 100 MHz capacitively coupled discharges using mass spectrometry
- Mechatronics and Manufacturing Technology Center, Samsung Electronics Co. Ltd., 416 Maetan-3 dong, Yeongtong-Gu, Suwon, Gyeonggi-Do 443-742 (Korea, Republic of)
The signals of positive ions and radicals formed in the fluorocarbon plasma of the capacitively coupled plasma reactor were measured using a quadrupole mass spectrometry and optical emission actinometry. The plasma was produced at 60 and 100 MHz frequencies for the same reactor configuration and gas mixtures. Experiments were performed at 25 mTorr with a SiO{sub 2} wafer on the grounded electrode. Mass spectra of ions were measured in C{sub 4}F{sub 8}/O{sub 2}/Ar and C{sub 4}F{sub 6}/O{sub 2}/Ar gas mixtures at 500-1500 W generator powers. For 60 and 100 MHz discharges production of fluorocarbon ions and radicals is discussed. It was found that the production of heavy species increases with frequency. The high mass signals such as C{sub 3}F{sub 3}{sup +}, C{sub 2}F{sub 4}{sup +}, C{sub 2}F{sub 5}{sup +}, C{sub 3}F{sub 5}{sup +}, C{sub 4}F{sub 7}{sup +} decrease when CHF{sub 3} is added to the gas mixture. However, the signals of CF{sub x}{sup +} (x=1,2,3) do not change significantly. These results are compared to the results of polymer film deposition on the wafer. It was suggested to control the polymerization film formation by adding small amount of CHF{sub 3} to the process mixture.
- OSTI ID:
- 21192417
- Journal Information:
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 26, Issue 5; Other Information: DOI: 10.1116/1.2965812; (c) 2008 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
- Country of Publication:
- United States
- Language:
- English
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