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Title: Structural properties of nitrogenated amorphous carbon films: Influence of deposition temperature and radiofrequency discharge power

Abstract

The structural properties of nitrogenated amorphous carbon deposited by radiofrequency magnetron sputtering of graphite in pure N{sub 2} plasma are investigated as a function of the substrate temperature and radiofrequency discharge power. The film composition is derived from x-ray photoemission spectroscopy, nuclear reaction analysis and elastic recoil detection measurements and the film microstructure is discussed using infrared, Raman, x-ray photoemission and near edge x-ray absorption fine structure spectroscopic results. At low deposition temperature and low radiofrequency power, the films are soft, porous, and easily contaminated with water vapor and other atmospheric components. The concentration of nitrogen in the films is very large for low deposition temperatures ({approx}33.6 at. % N at 150 deg. C) but decreases strongly when the synthesis temperature increases ({approx}15 at. % N at 450 deg. C). With increasing deposition temperature and discharge power values, the main observed effects in amorphous carbon nitride alloys are a loss of nitrogen atoms, a smaller hydrogen and oxygen contamination related to the film densification, an increased order of the aromatic sp{sup 2} phase, and a strong change in the nitrogen distribution within the carbon matrix. Structural changes are well correlated with modifications of the optical and transport properties.

Authors:
 [1];  [2]; ;  [3];  [4];  [5]
  1. IFIM, Bacau University, Calea Marasesti 157, 600115 Bacau (Romania)
  2. LFP, SPAM, CEA-Saclay, 91191 Gif sur Yvette Cedex (France)
  3. Laboratoire de Physique de la Matiere Condensee, Faculte des Sciences, Universite de Picardie-Jules Verne, 33 rue Saint-Leu, 80039 Amiens Cedex (France)
  4. Laboratoire GEMaC-UMR 8635-CNRS, 92100 Meudon Cedex (France)
  5. Institut de Physique de Rennes (UMR 6251-CNRS), Universite de Rennes 1, 35000 Rennes (France)
Publication Date:
OSTI Identifier:
21182665
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 104; Journal Issue: 7; Other Information: DOI: 10.1063/1.2951622; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ABSORPTION SPECTROSCOPY; AMORPHOUS STATE; CARBON NITRIDES; FINE STRUCTURE; GRAPHITE; HYDROGEN; INFRARED SPECTRA; MICROSTRUCTURE; NITROGEN; NUCLEAR REACTION ANALYSIS; OXYGEN; PHOTOEMISSION; POROUS MATERIALS; RAMAN SPECTRA; SPUTTERING; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE 0400-1000 K; THIN FILMS; WATER VAPOR; X-RAY PHOTOELECTRON SPECTROSCOPY

Citation Formats

Lazar, G, Bouchet-Fabre, B, Zellama, K, Clin, M, Ballutaud, D, and Godet, C. Structural properties of nitrogenated amorphous carbon films: Influence of deposition temperature and radiofrequency discharge power. United States: N. p., 2008. Web. doi:10.1063/1.2951622.
Lazar, G, Bouchet-Fabre, B, Zellama, K, Clin, M, Ballutaud, D, & Godet, C. Structural properties of nitrogenated amorphous carbon films: Influence of deposition temperature and radiofrequency discharge power. United States. https://doi.org/10.1063/1.2951622
Lazar, G, Bouchet-Fabre, B, Zellama, K, Clin, M, Ballutaud, D, and Godet, C. 2008. "Structural properties of nitrogenated amorphous carbon films: Influence of deposition temperature and radiofrequency discharge power". United States. https://doi.org/10.1063/1.2951622.
@article{osti_21182665,
title = {Structural properties of nitrogenated amorphous carbon films: Influence of deposition temperature and radiofrequency discharge power},
author = {Lazar, G and Bouchet-Fabre, B and Zellama, K and Clin, M and Ballutaud, D and Godet, C},
abstractNote = {The structural properties of nitrogenated amorphous carbon deposited by radiofrequency magnetron sputtering of graphite in pure N{sub 2} plasma are investigated as a function of the substrate temperature and radiofrequency discharge power. The film composition is derived from x-ray photoemission spectroscopy, nuclear reaction analysis and elastic recoil detection measurements and the film microstructure is discussed using infrared, Raman, x-ray photoemission and near edge x-ray absorption fine structure spectroscopic results. At low deposition temperature and low radiofrequency power, the films are soft, porous, and easily contaminated with water vapor and other atmospheric components. The concentration of nitrogen in the films is very large for low deposition temperatures ({approx}33.6 at. % N at 150 deg. C) but decreases strongly when the synthesis temperature increases ({approx}15 at. % N at 450 deg. C). With increasing deposition temperature and discharge power values, the main observed effects in amorphous carbon nitride alloys are a loss of nitrogen atoms, a smaller hydrogen and oxygen contamination related to the film densification, an increased order of the aromatic sp{sup 2} phase, and a strong change in the nitrogen distribution within the carbon matrix. Structural changes are well correlated with modifications of the optical and transport properties.},
doi = {10.1063/1.2951622},
url = {https://www.osti.gov/biblio/21182665}, journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 7,
volume = 104,
place = {United States},
year = {Wed Oct 01 00:00:00 EDT 2008},
month = {Wed Oct 01 00:00:00 EDT 2008}
}