Preparation of TiO{sub 2} thin films on the inner surface of a quartz tube using atmospheric-pressure microplasma
- Department of Electrical and Electronic Engineering, Tsuruoka National College of Technology, 104 Inooka-Sawada, Tsuruoka, Yamagata 997-8511 (Japan)
Titanium dioxide (TiO{sub 2}) thin films were prepared on the inner surface of a quartz tube, with inner and outer diameters of 1 and 3 mm, respectively, using plasma-enhanced chemical vapor deposition with titanium tetraisopropoxide and oxygen (O{sub 2}) as reactants and helium as the carrier gas at atmospheric pressure. A microplasma was generated inside the tube by rf (13.56 MHz) excitation using externally attached parallel-plate electrodes. The characteristics of the deposited films were examined by scanning electron microscopy, x-ray photoelectron spectroscopy, and x-ray diffraction. A typical as-deposited film had an amorphous structure with a smooth surface and was transparent. With increasing O{sub 2} concentration in the plasma gas phase, the deposited film surface was covered with a large number of TiO{sub 2} nanoparticles. However, the deposited films were a mixture of TiO{sub 2} and amorphous carbon and showed rough surface in the absence of O{sub 2} in the source gas. The effects of the O{sub 2} concentration in the plasma gas on the characteristics of the deposited TiO{sub 2} films are discussed on the basis of the analysis of the gas species generated in the plasma using optical emission spectroscopy.
- OSTI ID:
- 21123901
- Journal Information:
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 26, Issue 3; Other Information: DOI: 10.1116/1.2891251; (c) 2008 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
- Country of Publication:
- United States
- Language:
- English
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