Preparation and characterization of (001)- and (110)-oriented 0.6FeTiO{sub 3}{center_dot}0.4Fe{sub 2}O{sub 3} films for room temperature magnetic semiconductors
- Department of Material Chemistry, Graduate School of Natural Science and Technology, Okayama University, Tsushimanaka 3-1-1, Okayama 700-8530 (Japan)
Thin films of ilmenite-hematite solid solution 0.6FeTiO{sub 3}{center_dot}0.4Fe{sub 2}O{sub 3} were prepared on {alpha}-Al{sub 2}O{sub 3} (001) and (110) single-crystalline substrates. The oxide phases formed in the thin films strongly depended on the oxygen partial pressure (P{sub O{sub 2}}) during deposition. At P{sub O{sub 2}}=1.3x10{sup -3} Pa, regardless of thesubstrate orientation, well-ordered 0.6FeTiO{sub 3}{center_dot}0.4Fe{sub 2}O{sub 3} films with R3 symmetry were epitaxially formed. Large saturation magnetization at room temperature was observed in both (001)- and (110)-oriented films. The differences in the magnetization and electrical resistivity curves between the (001)- and (110)-oriented films indicated the anisotropic nature of 0.6FeTiO{sub 3}{center_dot}0.4Fe{sub 2}O{sub 3}.
- OSTI ID:
- 21120864
- Journal Information:
- Applied Physics Letters, Vol. 92, Issue 25; Other Information: DOI: 10.1063/1.2951589; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ALUMINIUM OXIDES
ANISOTROPY
CRYSTAL GROWTH
DEPOSITION
ELECTRIC CONDUCTIVITY
EPITAXY
FERRIMAGNETIC MATERIALS
HEMATITE
ILMENITE
IRON COMPOUNDS
MAGNETIC SEMICONDUCTORS
MAGNETIZATION
MONOCRYSTALS
OXYGEN
PARTIAL PRESSURE
SOLID SOLUTIONS
SPUTTERING
TEMPERATURE RANGE 0273-0400 K
THIN FILMS
TITANATES