Nonequilibrium atmospheric pressure plasma with ultrahigh electron density and high performance for glass surface cleaning

Journal Article · Mon Feb 25 00:00:00 EST 2008 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2885084· OSTI ID:21120553

Iwasaki, Masahiro; Matsudaira, Yuto; Hori, Masaru ^[1]; Inui, Hirotoshi ^[2]; Kano, Hiroyuki ^[3]; Yoshida, Naofumi ^[4]; Ito, Masafumi ^[5]

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1. Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)
2. Department of Electrical and Electronic Engineering, Graduate School of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502 (Japan)
3. NU Eco-Engineering Co., Ltd., 1237-87 Kurozawa, Miyoshi-cho, Nishikamo-gun, Aichi 470-0201 (Japan)
4. Fuji Machine Mfg. Co., Ltd., 19 Chausuyama, Yamamachi, Chiryu, Aichi 472-8686 (Japan)
5. Department of Opto-Mechatronics, Faculty of Systems Engineering, Wakayama University, 930 Sakaedani, Wakayama 640-8510 (Japan)

We produced a nonequilibrium atmospheric pressure plasma by applying an alternative current between two electrodes. The gas temperature and electron density were evaluated using optical emission spectroscopy. It was found that the plasma had gas temperatures from 1800 to 2150 K and ultrahigh electron densities in the order of 10{sup 16} cm{sup -3}. A remarkably high oxygen radical concentration of 1.6x10{sup 15} cm{sup -3} was obtained at a 1% O{sub 2}/Ar gas flow rate of 15 slm (standard liters per minute). Contact angles below 10 deg. were obtained in the process of glass cleaning with a plasma exposure time of 23 ms.

• OSTI ID: 21120553
• Journal Information: Applied Physics Letters, Vol. 92, Issue 8; Other Information: DOI: 10.1063/1.2885084; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ATMOSPHERIC PRESSURE
ELECTRODES
ELECTRON DENSITY
ELECTRON TEMPERATURE
EMISSION SPECTROSCOPY
GAS FLOW
GLASS
ION TEMPERATURE
OXYGEN
PERFORMANCE
PLASMA
PLASMA DENSITY
PLASMA DIAGNOSTICS
RADICALS
SURFACE CLEANING