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Title: Alternate Multilayer Gratings with Enhanced Diffraction Efficiency in the 500-5000 eV Energy Domain

An alternate multilayer (AML) grating is a 2 dimensional diffraction structure formed on an optical surface, having a 0.5 duty cycle in the in-plane and in the in-depth direction. It can be made by covering a shallow depth laminar grating with a multilayer stack. We show here that their 2D structure confer AML gratings a high angular and energetic selectivity and therefore enhanced diffraction properties, when used in grazing incidence. In the tender X-ray range (500eV - 5000 eV) they behave much like blazed gratings. Over 15% efficiency has been measured on a 1200 lines/mm Mo/Si AML grating in the 1.2 - 1.5 keV energy range. Computer simulations show that selected multilayer materials such as Cr/C should allow diffraction efficiency over 50% at photon energies over 3 keV.
Authors:
; ;  [1] ; ;  [2] ; ; ; ;  [3]
  1. Synchrotron SOLEIL, L'orme des Merisiers, BP 48, 91192 Gif-sur-Yvette Cedex (France)
  2. HORIBA Jobin Yvon SAS, 16-18 rue du Canal, 91165 Longjumeau Cedex (France)
  3. Laboratoire Charles Fabry de l'Institut d'Optique, Centre Scientifique Bat. 503, 91403 Orsay (France)
Publication Date:
OSTI Identifier:
21052560
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 879; Journal Issue: 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436105; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; CARBON; CHROMIUM; COMPUTERIZED SIMULATION; DIFFRACTION GRATINGS; EFFICIENCY; EV RANGE; INTERFACES; KEV RANGE; LAYERS; MOLYBDENUM; PHOTON BEAMS; SILICON; SURFACES; X RADIATION; X-RAY DIFFRACTION